Stability of SiNX/SiNX double stack antireflection coating for single crystalline silicon solar cells.
Stability of SiNX/SiNX double stack antireflection coating for single crystalline silicon solar cells.
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DOI：
10.1186/1556-276x-7-50
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发表时间：
2012-01-05
影响因子：
--
通讯作者：
Yi J
中科院分区：
文献类型：
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作者：
Lee Y;Gong D;Balaji N;Lee YJ;Yi J
双层叠层反射涂层由于其对太阳光谱的宽范围覆盖而比单层反射涂层具有显著的优势。具有60-nm/20-nm SiNX：H双堆叠涂层的太阳能电池具有17.8%的效率，而具有80-nm SiNX：H单涂层的太阳能电池具有17.2%的效率。效率的提高是由于双叠层钝化膜的钝化效果好、吸湿性好。重要的是，SiNX：H膜具有对应力因素的强抵抗力，因为它们被用作太阳能电池的减反射涂层。然而，SiNX：H膜对外部应力的耐受性从未被研究过。本文研究了等离子体增强化学气相沉积系统制备的SiNX：H薄膜的稳定性。使用各种形式的强制降解进行稳定性试验，例如延长的热循环、湿度和紫外线暴露。湿热测试进行100小时，保持湿度在85%，并施加在5小时内从-20 ° C至85°C快速变化温度的热循环。使用180-W UV灯进行UV暴露50小时。这证实了双叠层涂层对外部应力是稳定的。
Double stack antireflection coatings have significant advantages over single-layer antireflection coatings due to their broad-range coverage of the solar spectrum. A solar cell with 60-nm/20-nm SiNX:H double stack coatings has 17.8% efficiency, while that with a 80-nm SiNX:H single coating has 17.2% efficiency. The improvement of the efficiency is due to the effect of better passivation and better antireflection of the double stack antireflection coating. It is important that SiNX:H films have strong resistance against stress factors since they are used as antireflective coating for solar cells. However, the tolerance of SiNX:H films to external stresses has never been studied. In this paper, the stability of SiNX:H films prepared by a plasma-enhanced chemical vapor deposition system is studied. The stability tests are conducted using various forms of stress, such as prolonged thermal cycle, humidity, and UV exposure. The heat and damp test was conducted for 100 h, maintaining humidity at 85% and applying thermal cycles of rapidly changing temperatures from -20°C to 85°C over 5 h. UV exposure was conducted for 50 h using a 180-W UV lamp. This confirmed that the double stack antireflection coating is stable against external stress.