A novel radio-frequency plasma probe for monitoring systems in dielectric deposition processes
A novel radio-frequency plasma probe for monitoring systems in dielectric deposition processes
复制标题
一种用于介电沉积过程中监测系统的新型射频等离子体探头
DOI：
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发表时间：
2012
期刊：
影响因子：
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通讯作者：
I. Rolfes
中科院分区：
文献类型：
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作者：
C. Schulz;T. Styrnoll;M. Lapke;J. Oberrath;R. Storch;P. Awakowicz;R. Brinkmann;T. Musch;T. Mussenbrock;I. Rolfes
本文提出了一种新颖的工业兼容等离子体探针，用于介电沉积过程中的监测系统。该探头基于所谓的主动等离子体共振光谱，可以对监督和控制等离子体沉积过程所需的不同重要等离子体参数进行广泛评估。由于其组装方式，探头对附加介电涂层不敏感。因此，测量性能不受影响。伪等离子体沉积过程中探针的 3D 电磁场模拟以及真实沉积过程中原型的测量显示出与预期行为的良好一致性，并证实了探针作为电介质沉积过程监测工具的适用性。
This paper presents a novel industry compatible plasma probe for monitoring systems in dielectric deposition processes. The probe is based on the so called active plasma resonance spectroscopy and allows an extensive evaluation of different important plasma parameters, needed for the supervision and control of the plasma deposition process. Due to its assembly, the probe is insensitive against additional dielectric coating. Hence, the measurement performance is not affected. 3D-electromagnetic field simulations of the probe in a pseudo plasma deposition process, as well as the measurement with a prototype in a real deposition process show a good agreement with the expected behaviour and confirm the applicability of the probe as a monitoring tool for dielectric deposition processes.