The disappearing anode myth: strategies and solutions for reactive PVD from single magnetrons
The disappearing anode myth: strategies and solutions for reactive PVD from single magnetrons
复制标题
消失的阳极神话：单磁控管反应性 PVD 的策略和解决方案
DOI：
10.1016/s0257-8972(97)00438-6
复制
发表时间：
1997
影响因子：
5.4
通讯作者：
J. Sellers
中科院分区：
文献类型：
--
作者：
J. Sellers
自脉冲直流反应溅射出现以来，以有效速率生产高质量介电膜的能力在工业和研究环境中得到了很好的证明。许多优雅的解决方案，以控制的质量平衡的反应性等离子体已经开发和证明。等离子体发射监测仪、分压控制等扩展了脉冲直流技术的可用范围。许多使用介电膜的人关心的一个领域是等离子工具在涂有介电膜时的阳极降解。本文将研究这一问题的根源以及导致这一问题的等离子体系统变量。一般的单磁控管解决方案将描述和解释使用的例子清楚。本文将讨论和比较各种屏蔽方法。最后，将针对最坏情况生成一个解决方案，对结果进行检查，并与双磁控管解决方案进行成本比较。
Since the advent of pulsed dc reactive sputtering, the capacity to produce high-quality dielectric films at useful rates has been well proven in industrial and research environments. A number of elegant solutions to the control of the mass balances of the reactive plasma have been developed and proven. Plasma emission monitors, partial pressure control, and others have extended the useable envelope of pulsed dc technology. One area of concern for many working with dielectric films is anode degradation of the plasma tool as it is coated with the dielectric film. This paper will examine the source of this problem and the plasma system variables that contribute to the issue. General single magnetron solutions will be described and explained with examples used for clarity. Shielding methods will be discussed and compared. Finally, a solution will be generated for a worst case example system, results examined, and costs compared with dual magnetron solutions.