Critical Role of Structural Water for Enhanced Li + Insertion Kinetics in Crystalline Tungsten Oxides

Critical Role of Structural Water for Enhanced Li + Insertion Kinetics in Crystalline Tungsten Oxides
复制标题

结构水对于增强结晶氧化钨中锂插入动力学的关键作用

DOI:
10.1149/1945-7111/ac58c8
复制
发表时间:
2022
影响因子:
3.9
通讯作者:
Augustyn, Veronica
Augustyn, Veronica
中科院分区:
工程技术4区
文献类型:
--
作者:
Mitchell, James B.;Wang, Ruocun;Ko, Jesse S.;Long, Jeffrey W.;Augustyn, Veronica

文献摘要

相似文献

过渡金属氧化物中的电化学离子插入形成了几种能源技术的基础。过渡金属氧化物在离子插入过程中会表现出缓慢的离子传输和/或相变动力学,这可能会限制其在高速率(<10分钟)下的性能。用阶梯恒电位电化学阻抗谱(SPEIS)和电化学石英晶体微天平(EQCM)分析了WO_3·H_2O和WO_3薄膜电极在Li+插入过程中结构水在过渡金属氧化物中的作用。与WO_3相比,WO_3·H_2O中结构水的存在改善了Li+的插入动力学,导致插入过程对电位的依赖性较小。纳米结构薄膜的OPANDO电重法和3DBode阻抗分析表明,结构水的存在促进了电荷调节,而没有明显的溶剂共插入,这导致了我们的假设,即WO_3的电化学诱导的结构转变阻碍了电极在较快的时间尺度(<10min)下的响应。设计具有较少结构转变的受限流体的层状材料,可能会为下一代电化学技术带来更多用途的离子插入主体。
Electrochemical ion insertion into transition metal oxides forms the foundation of several energy technologies. Transition metal oxides can exhibit sluggish ion transport and/or phase-transformation kinetics during ion insertion that can limit their performance at high rates (< 10 min). In this study, we investigate the role of structural water in transition metal oxides during Li+ insertion using staircase potentiostatic electrochemical impedance spectroscopy (SPEIS) and electrochemical quartz crystal microbalance (EQCM) analysis of WO 3· H 2 O and WO 3 thin-film electrodes. Overall, the presence of structural water in WO 3· H 2 O improves Li+ insertion kinetics compared to WO 3 and leads to a less potential-dependent insertion process. Operando electrogravimetry and 3D Bode impedance analyses of nanostructured films reveal that the presence of structural water promotes charge accommodation without significant co-insertion of solvent, leading to our hypothesis that the electrochemically induced structural transitions of WO 3 hinder the electrode response at faster timescales (< 10 min). Designing layered materials with confined fluids that exhibit less structural transitions may lead to more versatile ion-insertion hosts for next-generation electrochemical technologies.