Behavior of microfluidic amplifiers

Behavior of microfluidic amplifiers
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DOI:
10.1016/s0924-4247(96)01229-0
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发表时间:
1995-11-01
影响因子:
4.6
通讯作者:
Zemel, JN
Zemel, JN
中科院分区:
工程技术3区
文献类型:
--
作者:
Furlan, R;Zemel, JN

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两种类型的微流体放大器(附壁和射流偏转)已在硅中使用标准的微机械加工方法和阳极密封与玻璃帽。该设备的面积约为1 mm × 0.5 mm,完整的结构与互连通道的面积为12或18 mm × 6 mm。流量控制和流量增益证明与供应压力范围高达630 kPa,使用干燥氮气作为测试流体。在两个装置中,在足够高的供应压力下,从两个输出端口观察到不对称的输出流,这表明可能形成冲击波。射流偏转微流体放大器呈现出更对称的行为,并且提供比壁附接装置更高的流动变化。最大和最小输出流量的比率,如针对各种控制和供应压力的射流偏转装置所测量的,揭示了在阻塞供应流量开始时的性能退化。
Two types of microfluidic amplifiers (wall-attachment and jet-deflection) have been implemented in silicon using standard micromachining methods and anodic sealing with a glass cap. The devices have areas of approximately 1 mm X 0.5 mm and the complete structures with interconnection channels have areas of 12 or 18 mm X 6 mm. Flow control and flow gain are demonstrated with supply pressures ranging up to 630 kPa, using dry nitrogen as the test fluid. An asymmetric output flow is observed from the two output ports at sufficiently high supply pressures in both devices, suggesting possible shock-wave formation. The jet-deflection microfluidic amplifier presents a more symmetric behavior and provides higher flow variation than the wall-attachment device. The ratio of the maximum and minimum output flows, as measured for the jet-deflection device for various control and supply pressures, reveals a performance degradation at the onset of choked supply flow.