PLASMA SOURCE ION-IMPLANTATION - A NEW, COST-EFFECTIVE, NON-LINE-OF-SIGHT TECHNIQUE FOR ION-IMPLANTATION OF MATERIALS
PLASMA SOURCE ION-IMPLANTATION - A NEW, COST-EFFECTIVE, NON-LINE-OF-SIGHT TECHNIQUE FOR ION-IMPLANTATION OF MATERIALS
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DOI：
10.1016/0257-8972(88)90033-3
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发表时间：
1988-12-15
影响因子：
5.4
通讯作者：
QIU, X
中科院分区：
文献类型：
--
作者：
CONRAD, JR;DODD, RA;QIU, X
离子轰击表面改性是提高材料硬度、摩擦力、耐磨性和耐腐蚀性的成熟技术。通过传统离子注入对材料进行表面改性是一种视线过程，其中定向高能离子束光栅穿过目标。如果目标是三维的，则该过程通常需要目标操纵以实现在物体的整个表面上的均匀植入。相对于更传统的表面处理，这种目标操纵要求会严重限制离子注入的成本效益，特别是对于大型和/或重型目标。我们正在开发一种新技术，等离子体源离子注入（PSII），它规避了传统离子注入的视线限制。在 PSII 中，将要植入的目标直接放置在等离子体源室中，然后脉冲偏置到高负电压（在我们的实验中为 10 – 100 kV）。目标周围形成厚厚的离子基质鞘，离子加速穿过鞘滴并从各个侧面同时轰击目标，而无需对目标进行操纵。尽管PSII工艺与“离子电镀”、“离子涂层”或“等离子氮化”等现有技术表面上相似，但PSII产生高能离子注入的沉积轮廓特征。我们的实验表明，PSII (1) 有效地将离子注入到表面改性所需的浓度和深度，(2) 生产出具有改善的显微硬度和耐磨性能的材料，以及 (3) 显着提高了实际工业应用中制造工具的寿命。例如，在最近的工业现场测试中，用于在低碳钢板上打孔的 M-2 冲孔冲头的工具寿命增加了 70 - 80 倍。在本文中，我们描述了 (1) 一系列正在进行的现场测试的最新结果，(2) PSII 工艺扩展到离子束混合和离子束增强沉积操作模式，以及分子离子注入，以及 (3) PSII 相对于传统离子注入进行表面改性的比较经济性。
Surface modification by ion bombardment is a well-established technique for improving the hardness, friction, wear resistance and corrosion resistance of materials. Surface modification of materials by conventional ion implantation is a line-of-sight process in which a directed beam of energetic ions is rastered across a target. If the target is three dimensional, the process generally requires target manipulation to achieve uniform implantation over the entire surface of the object. This target manipulation requirement can seriously limit the cost effectiveness of ion implantation relative to more conventional surface treatments, especially for large and/or heavy targets. We are developing a new technique, plasma source ion implantation (PSII), which circumvents the line-of-sight restriction of conventional ion implantation. In PSII, targets to be implanted are placed directly in a plasma source chamber and are then pulse biased to high negative voltage (10 – 100 kV in our experiments). A thick, ion matrix sheath forms around the target, and ions accelerate through the sheath drop and bombard the target from all sides simultaneously without the necessity of target manipulation. Although the PSII process bears a superficial resemblance to existing techniques such as “ion plating”, “ion coating” or “plasma nitriding”, PSII produces a deposition profile characteristic of high energy ion implantation. Our experiments have demonstrated that PSII (1) efficiently implants ions to the concentrations and depths required for surface modification, (2) produces material with improved microhardness and wear properties and (3) dramatically improves the life of manufacturing tools in actual industrial applications. For example, in recent industrial field tests the tool life of M-2 pierce punches used to produce holes in mild steel plate has been increased by a factor of 70 – 80. In this paper we describe (1) the latest results from a series of ongoing field tests, (2) extensions of the PSII process to ion beam mixing and ion beam enhanced deposition modes of operation, and implantation of molecular ions, and (3) the comparative economics of surface modification by PSII relative to conventional ion implantation.