Improvement of properties of TiN coating by optimising microstructural design
Improvement of properties of TiN coating by optimising microstructural design
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DOI：
10.1179/1743294413y.0000000177
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发表时间：
2014-01-01
影响因子：
2.8
通讯作者：
Yu, Z.
中科院分区：
文献类型：
--
作者：
Ji, J.;Niu, Y.;Yu, Z.
采用空心阴极放电法制备了具有三明治结构的多层TiN涂层。涂层中多层结构的引入明显抑制了柱状晶的外延生长。对比了多层TiN涂层与传统TiN涂层的结合力和耐磨性。通过优化结构设计，TiN涂层与基体的结合力和耐磨性得到明显提高。涂层的多层微结构堆积位错，也抑制了大块剥落行为。多层TiN涂层的磨损机制为微区脱落。
Multilayered TiN coating, with a microstructure of stackered up sandwiches, was successfully prepared by hollow cathode discharge method. The columnar epitaxial growth was obviously suppressed by introduction of the multilayered microstructure in the coating. The adhesion and wear resistance of the multilayered TiN coating was compared with those of the conventional TiN coating. The adhesion of the TiN coating to the substrate and the wear resistance of the TiN coating are obviously improved by optimising structural design. The multilayered microstructure of the coating piles up the dislocations and also inhibits the bulk flaking behaviour. The wear mechanism of the multilayered TiN coating is the microarea detachment.