Frustration of photoionization in Ar nanoplasma produced by extreme ultraviolet FEL pulses
Frustration of photoionization in Ar nanoplasma produced by extreme ultraviolet FEL pulses
复制标题
极紫外 FEL 脉冲产生的 Ar 纳米等离子体中光电离的受挫
DOI:
10.1088/0953-4075/46/16/164019
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发表时间:
2013
期刊:
影响因子:
--
通讯作者:
H. Kimura
中科院分区:
文献类型:
--
作者:
H. Iwayama;K. Nagaya;M. Yao;H. Fukuzawa;X.-J. Liu;G. Prümper;K. Motomura;K. Ueda;N. Saito;A. Rudenko;L. Foucar;M. Nagasono;A. Higashiya;M. Yabashi;T. Ishikawa;H. Ohashi;H. Kimura
We report on the laser power dependence of photoabsorptions of Ar clusters irradiated by extreme ultraviolet–free electron laser (EUV–FEL) at the wavelength of 62 nm. We measured kinetic energy distributions of fragment ions with our ion momentum spectrometer. From the measured kinetic energy distributions, we estimated charge states of irradiated Ar clusters using the classical uniformly charged sphere model. Our results show that the EUV–FEL irradiation of Ar clusters results in the frustration of direct photoionization leading to nanoplasma formation and subsequent strong electron–ion charge recombination.