Bond-detach lithography: a method for micro/nanolithography by precision PDMS patterning.
Bond-detach lithography: a method for micro/nanolithography by precision PDMS patterning.
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DOI：
10.1002/smll.200500418
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发表时间：
2007-01
期刊：
影响因子：
13.3
通讯作者：
Abel L. Thangawng;M. Swartz;M. Glucksberg;R. Ruoff
中科院分区：
文献类型：
--
作者：
Abel L. Thangawng;M. Swartz;M. Glucksberg;R. Ruoff
We have discovered a micro/nanopatterning technique based on the patterning of a PDMS membrane/film, which involves bonding a PDMS structure/stamp (that has the desired patterns) to a PDMS film. The technique, which we call "bond-detach lithography", was demonstrated (in conjunction with other microfabrication techniques) by transferring several micro- and nanoscale patterns onto a variety of substrates. Bond-detach lithography is a parallel process technique in which a master mold can be used many times, and is particularly simple and inexpensive.
