Recent Advances in Polishing of Advanced Materials
Recent Advances in Polishing of Advanced Materials
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DOI：
10.1080/10426910802103486
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发表时间：
2008-06
影响因子：
4.8
通讯作者：
Z. Zhong
中科院分区：
文献类型：
--
作者：
Z. Zhong
本文讨论了先进材料抛光技术的最新进展。简要介绍了2005-2007年间发表的95篇期刊论文。主题包括化学机械抛光(CMP)、抛光流体、抛光建模、脆性材料的抛光、机器人抛光、振动抛光或横梁抛光以及抛光过程中的摩擦。在综述的文章中，化学机械抛光可能是最热门的研究主题。许多“非接触式”工艺是利用磁流体、电流变液和磨料流对复杂几何形状或难以接近的区域进行抛光。抛光过程的建模有助于理解抛光机理，因此在世界范围内得到越来越多的应用。在不久的将来，可以期待对抛光过程进行更多的模拟研究。对脆性材料的抛光要求也很高。使用机器人和数控机床自动抛光曲面，以及利用振动和梁进行抛光是很有前途的。研究抛光过程中的摩擦有助于了解抛光机理或控制抛光过程。
This article discusses the recent advances in polishing of advanced materials. Ninety-five journal articles published in 2005–2007 are briefly introduced. The topics are advances in chemical mechanical polishing (CMP), fluids for polishing, modeling of polishing, polishing of brittle materials, robotic polishing, polishing with vibrations or beams, and friction in polishing processes. CMP is perhaps the hottest research topic in the articles reviewed. Many “noncontact” processes are developed using magnetic fluids, electrorheological fluids, and abrasive flow for polishing of complicated geometries or difficult-to-approach regions. Modeling of polishing processes helps to understand the polishing mechanisms and is thus increasingly performed worldwide. More research on simulations of polishing processes can be expected in the near future. Polishing of brittle materials is also highly demanded. Automatic polishing of curved surfaces using robots and CNC machines, and polishing with vibrations and beams are promising. Investigations of friction in polishing processes help to understand the polishing mechanisms or control the polishing processes.