Atomically resolved scanning tunneling microscopy study of the adsorption and dissociation of methylchloride on Si(001)
Atomically resolved scanning tunneling microscopy study of the adsorption and dissociation of methylchloride on Si(001)
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Si(001)上氯甲烷吸附和解离的原子分辨扫描隧道显微镜研究
DOI：
10.1116/1.579826
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发表时间：
1995
期刊：
影响因子：
--
通讯作者：
R. Hamers
中科院分区：
文献类型：
--
作者：
M. Bronikowski;R. Hamers
利用扫描隧道显微镜研究了氯甲烷（CH3Cl）在Si（001）上的室温吸附和解离。碎片通过它们在下面的Si（001）晶格上的结合的对称性来识别。氯甲烷在室温下解离吸附，产生一个甲基和一个氯原子结合到表面。氯原子以各种几何形状结合，最常见的是两个氯原子键合到单个硅二聚体（一氯化硅二聚体）。当表面被加热到150 °C时，所有的Cl重新排列成这种单氯离子型键合构型，图像显示了单氯离子岛形成的开始。发现表面上的Cl：CH 3比率约为2：1，这意味着在反应中并非所有甲基基团都结合到表面上。
The room‐temperature adsorption and dissociation of methylchloride (CH3Cl) on Si(001) using scanning tunneling microscopy has been studied. Fragments are identified by the symmetry of their binding on the underlying Si(001) lattice. Methylchloride adsorbs dissociatively at room temperature, yielding a methyl group and a chlorine atom bound to the surface. Chlorine atoms bind in a variety of geometries, the most common being two chlorine atoms bonded to a single silicon dimer (silicon monochloride dimers). When the surface is heated to 150 °C, all Cl rearranges to this monochloride‐type bonding configuration, and images reveal the beginnings of monochloride island formation. The Cl:CH3 ratio on the surface is found to be approximately 2:1, implying that not all methyl groups are bound to the surface in the reaction.