BONDING OF H TO NI, PD, AND PT SURFACES
BONDING OF H TO NI, PD, AND PT SURFACES
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DOI：
10.1103/physrevlett.46.1085
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发表时间：
1981-01-01
影响因子：
8.6
通讯作者：
PLUMMER, EW
中科院分区：
文献类型：
--
作者：
EBERHARDT, W;GREUTER, F;PLUMMER, EW
用角分辨光电子能谱研究了H在Ni、Pd和Pt（111）面上的成键。吸附到冷却的衬底上的H产生化学吸附的光电子能谱特征。在这种状态下，H原子形成有序的覆盖层。将化学吸附层加热到10300 K导致H原子不可逆地过渡到次表面位置。
The bonding of H to the (111) surfaces of Ni, Pd, and Pt has been studied with use of angle-resolved photoelectron spectroscopy. H adsorbed onto a cooled substrate produces photoemission spectra characteristic of chemisorption. In this state the H atoms form an ordered overlayer. Heating the chemisorbed layer to∼ 300 K results in an irreversible transition of the H atoms into a subsurface site.