Computational study of 3-dimensional photo lithography on limitations and possibility for novel structures
Computational study of 3-dimensional photo lithography on limitations and possibility for novel structures
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3 维光刻计算研究新型结构的局限性和可能性
DOI：
10.1117/12.2658128
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发表时间：
2023
期刊：
影响因子：
--
通讯作者：
Sasago Masaru
中科院分区：
文献类型：
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作者：
Hirai Yoshihiko;Osumi Tomoaki;Tanaka Toshiaki;Yasuda Masaaki;Sasago Masaru
已经提出了使用内置透镜掩模(BILM)的3D光刻技术，该掩模可以在不使用透镜的情况下通过再现由玻璃掩模的复透射率在空间中形成的波前在任意焦点处形成光学图像，可以使用多聚焦功能来形成三维结构。在该方法中，将3D结构分解成多个种子图案，并将种子图像作为一批曝光。然而，形成种子图案的衍射光的相互干涉导致成像状态中的扰动，需要对掩模进行优化设计。在本研究中，我们进行了三维成像的基本验证实验，验证了多聚焦功能，回顾了种子设计，包括种子放置的自动优化，以便首先实现三维成像，然后实现复杂的三维成像，并验证了典型三维结构的可能性。
3D photolithography has been proposed using a built-in lens mask (BILM), which can form an optical image at an arbitrary focal point without using a lens by reproducing the wavefront formed in space by the complex transmittance of a glass mask, a three-dimensional structure can be formed using the multiple focus function. In this method, the 3D structure is decomposed into multiple seed patterns, and the seed images are exposed as a batch. However, the mutual interference of diffracted light to form the seed patterns causes turbulence in the image formation state, necessitating an optimized design of the mask. In this study, we conducted basic verification experiments for 3D imaging, verified the multiple focus function, reviewed the seed design including automatic optimization of the seed placement in order to first realize 3D image formation and then complex 3D image formation and verify the possibility for typical 3-D structures.