Interaction of oxygen with ZrN at room temperature: An XPS study†
Interaction of oxygen with ZrN at room temperature: An XPS study†
复制标题
室温下氧与 ZrN 的相互作用：XPS 研究†
DOI：
10.1002/sia.740210612
复制
发表时间：
1994
期刊：
影响因子：
--
通讯作者：
J. Sanz
中科院分区：
文献类型：
--
作者：
P. Prieto;L. Galán;J. Sanz
定量XPS已被用来表征在室温下的氧与氮化锆的相互作用。结果表明，ZrN在氧压力<10−7 Torr、氧暴露<104 L时不受影响。然而，在较高压力下较高的氧气暴露导致氮氧化物（ZrN0.5O0.5）和ZrO 2的形成。在108 L时达到饱和，形成由5 A ZrO 2形成的17 A厚的氧化层和平均组成为ZrN 0.5O 0.5的界面层（12 A厚）。的核心水平和价带的氮氧化物的分析表明其离子特性，以及它的绝缘性能相比，金属氮化锆。
Quantitative XPS has been used to characterize the interaction of oxygen with ZrN at room temperature. The results indicate that ZrN remains unaffected for oxygen exposures <104 L at oxygen pressures <10−7 Torr. However, higher oxygen exposures at higher pressures cause the formation of an oxynitride (ZrN0.5O0.5) and ZrO2. At 108 L saturation is reached, with the formation of an oxidized layer that is 17 A thick formed by 5 A of ZrO2 and an interface layer (12 A thick) of average composition ZrN0.5O0.5. Analysis of the core levels and valence band of the oxynitride demonstrates its ionic character as well as its insulating properties in comparison with metallic ZrN.