High-performance solution-processed polymer ferroelectric field-effect transistors
High-performance solution-processed polymer ferroelectric field-effect transistors
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DOI:
10.1038/nmat1329
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发表时间:
2005-03-01
期刊:
影响因子:
41.2
通讯作者:
De Leeuw, DM
中科院分区:
文献类型:
--
作者:
Naber, RCG;Tanase, C;De Leeuw, DM
We demonstrate a rewritable, non-volatile memory device with flexible plastic active layers deposited from solution. The memory device is a ferroelectric field-effect transistor (FeFET) made with a ferroelectric fluoropolymer and a bisalkoxy-substituted poly(p-phenylene vinylene) semiconductor material. The on- and off-state drain currents differ by several orders of magnitude, and have a long retention time, a high programming cycle endurance and short programming time. The remanent semiconductor surface charge density in the on- state has a high value of 18 mC m(-2), which explains the large on/off ratio. Application of a moderate gate field raises the surface charge to 26 mC m(-2), which is of a magnitude that is very difficult to obtain with conventional FETs because they are limited by dielectric breakdown of the gate insulator. In this way, the present ferroelectric-semiconductor interface extends the attainable field-effect band bending in organic semiconductors.