Kinetic smoothening and habit change during crystal growth
Kinetic smoothening and habit change during crystal growth
复制标题
晶体生长过程中的动力学平滑和习性改变
DOI：
10.2183/pjab.74.100
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发表时间：
1998
期刊：
影响因子：
--
通讯作者：
K. Nishioka
中科院分区：
文献类型：
--
作者：
M. Kitamura;K. Nishioka
在平衡条件下，没有沿着强键的晶面是原子粗糙的。这种面的生长被认为是由粘附生长机制控制的。在本研究中，这样一个面的二维晶体的生长进行了调查的基础上的晶体生长的概念，在一定条件下，通过一系列的过程，通过步骤网站上的扭结网站上的生长单元的掺入可以比直接掺入更快。这一概念揭示了一种类似于二维成核-生长的新的生长机制。新的机制预测，表面结构可以从平衡条件下的粗糙光滑的生长和溶解过程中，导致动力学平滑。新的机制还提供了一个一般的解释生长习性的变化，从一个多面体形状到另一个，这是不能解释的纯系统中的增长理论发表。
Crystal faces with no strong bonds along them are atomistically rough under equilibrium conditions. The growth of such faces has been considered to be governed by an adhesive growth mechanism. In the present study, the growth of such a face of a two-dimensional crystal is investigated based on a concept of crystal growth where, under certain conditions, the incorporation of growth units onto kink sites by a series process via step sites can be faster than the direct incorporation. This concept reveals a new growth mechanism similar to the two-dimensional nucleation-growth. The new mechanism predicts that surface structure can change from rough under equilibrium conditions to smooth in growth and dissolution processes, resulting in kinetic smoothening. The new mechanism also offers a general explanation of growth habit change from one polyhedral shape to another, something which could not be explained by the published theories of growth in pure systems.