Characterization of the accuracy of EUV phase-shifting point diffraction interferometry
Characterization of the accuracy of EUV phase-shifting point diffraction interferometry
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DOI：
10.1117/12.309563
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发表时间：
1998-06
期刊：
影响因子：
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通讯作者：
P. Naulleau;K. Goldberg;S. Lee;Chang Chang-Chang;Cynthia J. Bresloff;P. Batson;D. Attwood;J. Bokor
中科院分区：
文献类型：
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作者：
P. Naulleau;K. Goldberg;S. Lee;Chang Chang-Chang;Cynthia J. Bresloff;P. Batson;D. Attwood;J. Bokor
移相点衍射干涉仪（PS/PDI）最近在劳伦斯伯克利国家实验室开发和实施，以满足表征极紫外（EUV）投影光刻系统的重大测量挑战。这里的PS/PDI精度的表征的进展。影响干涉仪精度的主要有两类误差：第一类是由测量几何形状引起的系统效应，第二类是由不完美的参考波引起的随机和系统误差。为了表征这些贡献并校准干涉仪。实验结果表明，0.004波的系统误差限制的准确度的报告。
The phase-shifting point diffraction interferometer (PS/PDI) has recently been developed and implement at Lawrence Berkeley National Laboratory to meet the significant measurement challenge of characterizing extreme UV (EUV) projection lithography systems. Here progress on the characterization of the PS/PDI accuracy is presented. Two major classes of errors affect the accuracy of the interferometer: the first being systematic effects arising from the measurement geometry, and the second being random and systematic errors caused by an imperfect reference wave. In order to characterize these contribution and calibrate the interferometer. Experimental results demonstrating a systematic-error-limited accuracy of 0.004 waves is reported.