High-reflectivity (m=4) elliptical neutron focusing supermirror fabricated by numerically controlled local wet etching with ion beam sputter deposition
High-reflectivity (m=4) elliptical neutron focusing supermirror fabricated by numerically controlled local wet etching with ion beam sputter deposition
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DOI：
10.1016/j.nima.2009.11.070
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发表时间：
2010-05
影响因子：
1.4
通讯作者：
K. Yamamura;M. Nagano;N. Zettsu;Dai Yamazaki;R. Maruyama;K. Soyama
中科院分区：
文献类型：
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作者：
K. Yamamura;M. Nagano;N. Zettsu;Dai Yamazaki;R. Maruyama;K. Soyama
具有高形状精度和高反射率的高性能中子聚焦超镜装置对于有效地收集和聚焦中子束而没有散射损失是必不可少的。为了制造这些器件，数控局部湿法刻蚀和离子束溅射沉积技术的非球面反射镜基板的图形和沉积的NiC/Ti多层膜，分别开发。应用这些技术，制作了一个净孔径为90 mm × 40 mm的平椭圆超反射镜，用于冷中子束的聚焦。使用中子反射计评估了聚焦性能和反射率，并且在m=4的近临界角区域实现了4.4的聚焦增益和0.64-0.7的反射率。
High-performance neutron-focusing supermirror devices with both high figure accuracy and high reflectivity are essential to effectively collect and focus a neutron beam on a sample without scattering loss. To fabricate these devices, numerically controlled local wet etching and ion beam sputter deposition techniques were developed for the figuring of an aspherical mirror substrate and for the deposition of NiC/Ti multilayers, respectively. By applying these techniques, a plano-elliptical supermirror with a clear aperture size of 90mm×40mm was fabricated to focus a cold neutron beam. Focusing performance and reflectivity were evaluated using a neutron reflectometer and a focusing gain of 4.4 and a reflectivity of 0.64–0.7 in the near-critical-angle region for m=4 were achieved.