Atomically flat single-crystalline gold nanostructures for plasmonic nanocircuitry
Atomically flat single-crystalline gold nanostructures for plasmonic nanocircuitry
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DOI：
10.1038/ncomms1143
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发表时间：
2010-12-01
影响因子：
16.6
通讯作者：
Hecht, Bert
中科院分区：
文献类型：
--
作者：
Huang, Jer-Shing;Callegari, Victor;Hecht, Bert
高清晰度等离子体纳米结构的深亚波长集成在用于高速通信、量子计算和芯片实验室应用的未来光学纳米电路的开发中具有关键重要性。到目前为止，由多个功能元件组成的扩展等离子体网络的实验实现仍然具有挑战性，主要是因为常用的热蒸发金层的多结晶性。这可能会在单个电路元件中产生结构缺陷，从而大大降低功能集成纳米电路的产量。在本文中，我们展示了使用大（> 100 μ m（2）），但薄（< 80 nm）的化学生长的单晶金片，固定后，作为一个理想的基础上，聚焦离子束铣削和其他自上而下的纳米纤维技术在任何所需的基板。使用这种方法，我们获得高清晰度超光滑的金纳米结构，具有上级光学性能和可重复的纳米尺寸的功能超过微米长度尺度。我们的方法提供了一个可能的解决方案，以克服目前的制造瓶颈，实现高清晰度的等离子体纳米电路。
Deep subwavelength integration of high-definition plasmonic nanostructures is of key importance in the development of future optical nanocircuitry for high-speed communication, quantum computation and lab-on-a-chip applications. To date, the experimental realization of proposed extended plasmonic networks consisting of multiple functional elements remains challenging, mainly because of the multi-crystallinity of commonly used thermally evaporated gold layers. This can produce structural imperfections in individual circuit elements that drastically reduce the yield of functional integrated nanocircuits. In this paper we demonstrate the use of large (> 100 mu m(2)) but thin (< 80 nm) chemically grown single-crystalline gold flakes that, after immobilization, serve as an ideal basis for focused ion beam milling and other top-down nanofabrication techniques on any desired substrate. Using this methodology we obtain high-definition ultrasmooth gold nanostructures with superior optical properties and reproducible nano-sized features over micrometre-length scales. Our approach provides a possible solution to overcome the current fabrication bottleneck and realize high-definition plasmonic nanocircuitry.