Electrical Properties of VO_2 Thin Films and Post-annealing Effects on the Growth of Non-stoichiometric VOx

Electrical Properties of VO_2 Thin Films and Post-annealing Effects on the Growth of Non-stoichiometric VOx
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VO_2薄膜的电性能及后退火对非化学计量VOx生长的影响

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发表时间:
2013
期刊:
影响因子:
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通讯作者:
Nurul Hanis Azhan and Kunio Okimura
Nurul Hanis Azhan and Kunio Okimura
中科院分区:
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作者:
Hiromichi Hoshina;Shinya Ishii;Yusuke Morisawa;Harumi Sato;Isao Noda;Yukihiro Ozaki;Chiko Otani;TAKUMA TAKIMOTO,KOJI TAKESHITA,SEIJI NAKAMURA AND TSUGUNORI OKUMURA;Nurul Hanis Azhan and Kunio Okimura

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