Effect of Ultra-High Pulse Frequency on the resolution in the Electrochemical Deposition of Nickel
Effect of Ultra-High Pulse Frequency on the resolution in the Electrochemical Deposition of Nickel
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DOI：
10.1016/j.promfg.2021.06.010
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发表时间：
2021
期刊：
影响因子：
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通讯作者：
Abishek B. Kamaraj;N. Reed;M. Sundaram
中科院分区：
文献类型：
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作者：
Abishek B. Kamaraj;N. Reed;M. Sundaram
使用局部电化学沉积（LECD）作为无掩膜直接书写方法，打印金属形状。假设超高频下的电化学双层电容会引起局部沉积，并建立脉冲频率对电流密度的影响模型，以预测沉积分辨率和沉积速率。实验结果表明，随着脉冲频率的增加，液晶显示屏的沉积分辨率和效率均有所提高。在1 MHz脉冲功率下，使用直径为250 μm的工具制备镍基led，其沉积分辨率比刀具直径小80%。
Using localized electrochemical deposition (LECD) as a mask-less direct writing methodology, metal shapes are printed. The electrochemical double-layer capacitance at ultra-high frequencies is hypothesized to cause a localized deposition and the effect of pulse frequency on the current density is modeled to predict the deposition resolution and rate of deposition. Experimental results confirm that the deposition resolution and efficiency of the LECD process increase with the increase of pulse frequency. Deposition resolution 80% smaller than the tool diameter is feasible in the LECD of nickel used with a ø 250 μm tool at 1 MHz pulsed power.