Enhancing the interfacial perpendicular magnetic anisotropy and tunnel magnetoresistance by inserting an ultrathin LiF layer at an Fe/MgO interface
Enhancing the interfacial perpendicular magnetic anisotropy and tunnel magnetoresistance by inserting an ultrathin LiF layer at an Fe/MgO interface
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DOI:
10.1038/s41427-021-00350-8
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发表时间:
2022-01
影响因子:
9.7
通讯作者:
T. Nozaki;T. Nozaki;Tatsuya Yamamoto;M. Konoto;A. Sugihara;K. Yakushiji;H. Kubota;A. Fukushima;S. Yuasa
中科院分区:
文献类型:
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作者:
T. Nozaki;T. Nozaki;Tatsuya Yamamoto;M. Konoto;A. Sugihara;K. Yakushiji;H. Kubota;A. Fukushima;S. Yuasa
Perpendicular magnetic anisotropy (PMA) is becoming increasingly important in spintronics research, especially for high-density magnetoresistive random access memories (MRAMs). The PMA induced at an Fe/MgO interface is widely used in magnetic tunnel junctions. Here, we propose inserting an ultrathin LiF layer at the interface in an epitaxial Fe/MgO junction. With a 0.3 nm-thick LiF layer, a large intrinsic interface PMA energy,Ki,0, of 2.8 mJ/m2was achieved. We also found that the LiF/MgO bilayer tunneling barrier exhibited a large tunnel magnetoresistance (TMR) effect, suggesting that a coherent spin-dependent tunneling process was maintained in the ultrathin LiF layer. Atomic-scale interface engineering using fluoride can further improve the PMA and TMR properties of spintronic devices.