Smart block copolymer masks with molecule-transport channels for total wet nanopatterning
Smart block copolymer masks with molecule-transport channels for total wet nanopatterning
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DOI：
10.1039/b806378h
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发表时间：
2008-12
影响因子：
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通讯作者：
R. Watanabe;K. Kamata;T. Iyoda
中科院分区：
文献类型：
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作者：
R. Watanabe;K. Kamata;T. Iyoda
采用液晶（LC）集成两亲性嵌段共聚物（BC）掩模与垂直排列的聚（环氧乙烷）（PEO）圆柱形域作为分子传输通道的硅晶片表面上的总湿纳米图案化的证明。这种智能BC掩模使我们能够制造六边形排列的纳米孔阵列，通过硅晶片表面的纳米图案化，具有在16-40 nm范围内的可调周期性和精确的转录，精度为几纳米。在成功的湿法纳米图案化中，将聚乙二醇单甲醚混合到PEO圆柱体中成为纳米通道是诱导蚀刻试剂和产物有效传输的关键。使用我们的智能BC掩模和湿法蚀刻工艺的BC光刻可以被评估为硅晶片的低成本和大规模生产的湿法纳米图案化，并且可以通过选择适当的蚀刻试剂应用于各种各样的衬底，例如金属，半导体，玻璃和聚合物。
Total wet nanopatterning on silicon wafer surface by using liquid-crystalline (LC) integrated amphiphilic block copolymer (BC) masks with perpendicularly aligned poly(ethylene oxide) (PEO) cylindrical domains as molecule-transport channels is demonstrated. This smart BC mask enables us to fabricate hexagonally arranged nanohole arrays, by nanopatterning of silicon wafer surfaces, with tunable periodicity in a range of 16–40 nm and precise transcription with an accuracy of a few nanometers. Blending poly(ethylene glycol) monomethyl ether into the PEO cylinders to be nanochannels is a key trick to induce effective transportation of both etching reagents and products in the successful wet nanopatterning. The BC lithography with our smart BC masks and wet etching processes may be evaluated as a low-cost and mass-productive wet nanopatterning of silicon wafers, and may be applied to wide variety of substrates such as metals, semiconductors, glasses, and polymers by choosing appropriate etching reagents.