Monolayer resolution in medium-energy ion-scattering experiments on the NiSi2(111) surface.
Monolayer resolution in medium-energy ion-scattering experiments on the NiSi2(111) surface.
复制标题
NiSi2(111) 表面中能离子散射实验中的单层分辨率。
DOI：
10.1103/physrevlett.67.1134
复制
发表时间：
1991
影响因子：
8.6
通讯作者：
J. F. V. D. Veen
中科院分区：
文献类型：
--
作者：
J. Vrijmoeth;P. Zagwijn;J. Frenken;J. F. V. D. Veen
采用一种新的离子散射方法测定了外延nisi2 /Si（111）体系的表面结构。利用超高能分辨率检测背散射离子，我们可以解析来自连续原子层的信号。从它们的强度和能量，这取决于特定的离子轨迹，我们直接推断（亚）表面原子坐标。应用这种新方法，我们发现NiSi 2（111）表面具有块状拓扑结构，即它被Si-Ni-Si三层终止
The surface structure of the epitaxial NiSi 2 /Si(111) system has been determined applying a new ion-scattering method. Detecting backscattered ions with ultrahigh-energy resolution we resolve the signals from successive atomic layers. From both their intensity and energy, which depends on the specific ion trajectories, we directly deduce the (sub)surface atom coordinates. Applying this new approach, we find that the NiSi 2 (111) surface has a bulklike topology, i.e., it is terminated by a Si-Ni-Si triple layer