Photocatalytic degradation of RhB over MgFe2O4/TiO2 composite materials
Photocatalytic degradation of RhB over MgFe2O4/TiO2 composite materials
复制标题
MgFe2O4/TiO2复合材料光催化降解RhB
DOI：
10.1016/j.mseb.2011.09.022
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发表时间：
2011-11
期刊：
影响因子：
--
通讯作者：
Wu, Tinghua
中科院分区：
文献类型：
--
作者：
Zhang, Lei;He, Yiming;Wu, Ying;Wu, Tinghua
重点：>新型复合MgFe{sub 2}O{sub 4}/TiO{sub 2}催化剂。>在可见光照射下对RhB的光降解具有较高的活性。催化剂的焙烧温度对光催化活性有影响。>在紫外光和可见光照射下的不同降解机理。- 翻译后摘要：MgFe{sub 2}O{sub 4}/TiO{sub 2}（MFO/TiO{sub 2}）复合光催化剂成功地使用混合退火方法合成。在光催化降解罗丹明B的实验中，复合材料的光催化活性明显高于裸半导体。在紫外和可见光照射下，MgFe{sub 2}O{sub 4}（MFO）的最佳掺杂量为2 wt.%和3重量%，分别考察了焙烧温度对催化剂活性的影响。通过X射线衍射、紫外-可见漫反射光谱、扫描电子显微镜、透射电子显微镜和氮气物理吸附等表征手段，对高活性的来源进行了探讨。催化剂活性的提高主要归因于两种半导体之间的协同效应，它们的带电位匹配适当。
Highlights: > Novel composite MgFe{sub 2}O{sub 4}/TiO{sub 2} as catalyst. > Higher activity for the photodegradation of RhB under visible light irradiation. > Calcination temperature of catalyst has effect on photocatalytic activity. > Different photocatalysis mechanism under UV and visible light irradiation. - Abstract: MgFe{sub 2}O{sub 4}/TiO{sub 2} (MFO/TiO{sub 2}) composite photocatalysts were successfully synthesized using a mixing-annealing method. The synthesized composites exhibited significantly higher photocatalytic activity than a naked semiconductor in the photodegradation of Rhodamine B. Under UV and visible light irradiation, the optimal percentages of doped MgFe{sub 2}O{sub 4} (MFO) were 2 wt.% and 3 wt.%, respectively. The effects of calcination temperature on photocatalytic activity were also investigated. The origin of the high level of activity was discussed based on the results of X-ray diffraction, UV-vis diffuse reflection spectroscopy, scanning electron microscopy, transmission electron microscopy, and nitrogen physical adsorption. The enhanced activity of the catalysts was mainly attributed to the synergetic effect between the two semiconductors, the band potential of which matched suitably.
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DOI：
10.1146/annurev.ms.02.080172.002441
发表时间：
1972-08
期刊：
Annual Review of Materials Science
影响因子：
--
作者：
L. V. Ruyven
通讯作者：
L. V. Ruyven
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影响因子：
11.4
作者：
Huang, Hanjie;Li, Danzhen;Fu, Xianzhi
通讯作者：
Fu, Xianzhi
影响因子：
5.4
作者：
Shihong Xu;Daolun Feng;Deng-xin Li;W. Shangguan
通讯作者：
Shihong Xu;Daolun Feng;Deng-xin Li;W. Shangguan
影响因子：
4.5
作者：
C. Liu;Ming-wei Li;Zhonghui Cui;Juanru Huang;Yiyuan Tian;Tong Lin;W. Mi
通讯作者：
C. Liu;Ming-wei Li;Zhonghui Cui;Juanru Huang;Yiyuan Tian;Tong Lin;W. Mi
影响因子：
8.7
作者：
Jain, Rajeev;Mathur, Megha;Mittal, Alok
通讯作者：
Mittal, Alok