Localized magnetic modification of permalloy using Cr+ ion implantation

Localized magnetic modification of permalloy using Cr+ ion implantation
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使用 Cr 离子注入对坡莫合金进行局部磁改性

DOI:
10.1088/0022-3727/36/21/001
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发表时间:
2003
期刊:
Journal of Physics D
影响因子:
--
通讯作者:
A. Kellock
A. Kellock
中科院分区:
--
文献类型:
--
作者:
L. Folks;R. Fontana;B. Gurney;J. Childress;S. Maat;J. Katine;J. Baglin;A. Kellock

文献摘要

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用铬掺杂铁磁性镍铁合金会导致居里温度降低。我们已经证明,通过将Cr离子注入到铁磁性NiFe合金膜中,可以形成Ni-Fe-Cr的固态溶液,从而产生顺磁性膜。我们发现,磁矩和矫顽力随Cr+剂量的增加而稳定下降,在室温下随着顺磁性的出现而达到零。使用Cr+注入结合光刻掩模,我们已经图案化的连续Ni 80 Fe 20膜成单独的区域,在室温下是铁磁性和顺磁性的。该磁性图案化工艺可以应用于磁性写入头的制造,诸如用于限制来自写入间隙的杂散场的开槽工艺。
Doping ferromagnetic nickel–iron alloys with chromium causes the Curie temperature to be reduced. We have demonstrated that solid state solutions of Ni–Fe–Cr can be formed by implanting Cr ions into ferromagnetic NiFe alloy films, thus creating paramagnetic films. We find that the magnetic moment and coercivity decrease steadily with Cr+ dose, reaching zero at room temperature with the onset of paramagnetism. Using Cr+ implantation in conjunction with a lithographic mask we have patterned continuous Ni80Fe20 films into separate regions that are ferromagnetic and paramagnetic at room temperature. This magnetic patterning process may have applications for the manufacture of magnetic write heads, such as for the notching process used to constrain the stray field from the write gap.