Nano Lithography Based on Domain Patterning of Ferroelectrics
Nano Lithography Based on Domain Patterning of Ferroelectrics
复制标题
基于铁电体畴图案化的纳米光刻
DOI：
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发表时间：
2012
期刊：
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通讯作者：
A. Haußmann
中科院分区：
文献类型：
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作者：
A. Haußmann
我们报道了利用铁电光刻的纳米技术和大规模可积方法组装贵金属纳米线，以及它们在电传输上的性能测试。我们对(mathm{LiNbO}_3)单晶模板的研究结果表明，离子溶液中光化学还原沉积的不同元素金属仅限于铁电180(^CIRC)磁畴壁。从这种典型的(30ldots 300)微米长的纳米线记录的电流-电压特性揭示了一种欧姆行为，甚至随着时间的推移而改善。此外，我们还使用动态扫描力显微镜(SFM)和开尔文探针力显微镜(KPFM)相结合的方法研究了这种导线的局部形貌和恒电位特性。
We report on both the assembly of noble-metal nanowires by means of the nanotechnological and large-scale integrable approach of ferroelectric lithography and their performance testing upon electrical transport. Our results on (mathrm{ LiNbO}_3) single crystal templates show that the deposition of different elemental metals from ionic solutions by photochemical reduction is confined to the ferroelectric 180(^circ ) domain walls. Current-voltage-characteristics recorded from such nanowires of typically ((30ldots 300),)µm in length revealed an ohmic behavior that even improved with time. Additionally, we also examined the local topographic and potentiostatic properties of such wires using dynamic scanning force microscopy (SFM) in combination with Kelvin probe force microscopy (KPFM).