Fabrication of Ferroelectric Photonic Crystals
Fabrication of Ferroelectric Photonic Crystals
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DOI：
10.1080/10584580590899063
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发表时间：
2005-01
影响因子：
0.7
通讯作者：
S. Okamura;Yuuki Mochiduki;Hiroyuki Motohara;T. Shiosaki
中科院分区：
文献类型：
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作者：
S. Okamura;Yuuki Mochiduki;Hiroyuki Motohara;T. Shiosaki
摘要利用电子束诱导图形化技术成功制备了由PLZT基质和间距为800 nm、直径为560 nm的空气孔组成的铁电光子晶体。由于基质收缩，前体基质中内接于直径为400 nm的圆的异形孔在热处理后变为直径为560 nm的圆孔。还评价了CSD衍生的PLZT膜的光学性质。PLZT薄膜的折射率为2.3，克尔常数为0.4 × 10− 16 m2/V2。因此，预期对1 μ m厚的PLZT光子晶体施加9.7V的电压会引起折射率降低1%和波长为1.55 μ m的光的40°摆动。
ABSTRACT Ferroelectric photonic crystals consisted of a PLZT matrix and 800 nm-pitch air-holes with a diameter of 560 nm were successfully fabricated by the electron-beam-induced patterning process. Hexagonal holes inscribed to the circles with a diameter of 400 nm in a precursor matrix changed to circular holes with a diameter of 560 nm after heat-treatment due to shrinkage of the matrix. The optical properties of CSD-derived PLZT films were also evaluated. The PLZT films showed the refractive index of 2.3 and the Kerr constant of 0.4 × 10− 16 m2/V2. Therefore, it is expected that an applied voltage of 9.7 V to 1 μ m-thick PLZT photonic crystals induces 1%-decrease in refractive index and 40°-swinging of light with a wavelength of 1.55 μ m.