Yuichi Setsuhara, Yasufumi OhchiKen Cho, Kosuke Takenaka, Akinori EbePlasma-Enhanced Sputtering Assisted with ICP via New Type of Low-Induetance Antenna for Reactivity-Controlled and Low-Damage Formation of Semiconductor Films
Yuichi Setsuhara, Yasufumi OhchiKen Cho, Kosuke Takenaka, Akinori EbePlasma-Enhanced Sputtering Assisted with ICP via New Type of Low-Induetance Antenna for Reactivity-Controlled and Low-Damage Formation of Semiconductor Films
复制标题
Yuichi Setsuhara、Yasufumi OhchiKen Cho、Kosuke Takenaka、Akinori Ebe 通过新型低电感天线辅助 ICP 等离子体增强溅射，实现反应控制和低损伤的半导体薄膜形成
DOI：
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发表时间：
2012
期刊：
影响因子：
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通讯作者：
Akinori Ebe
中科院分区：
文献类型：
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作者：
Yuichi Setsuhara;Yasufumi OhchiKen Cho;Kosuke Takenaka;Akinori Ebe
