Bromine Etching of Patterned YBa 2 Cu 3 O 6+x Nanoscale Thin Films for High-Temperature Superconducting Devices

Bromine Etching of Patterned YBa 2 Cu 3 O 6+x Nanoscale Thin Films for High-Temperature Superconducting Devices
复制标题

用于高温超导器件的图案化 YBa 2 Cu 3 O 6 x 纳米级薄膜的溴蚀刻

DOI:
10.1021/acsanm.1c03098
复制
发表时间:
2021
影响因子:
5.9
通讯作者:
Cybart, Shane
Cybart, Shane
中科院分区:
材料科学2区
文献类型:
--
作者:
Vinay, Miranda L.;LeFebvre, Jay C.;Cai, Han;Forman, Joseph;Cybart, Shane

文献摘要

相似文献

像YBa2Cu3O6+x(YBCO)这样的铜酸盐高温超导(HTS)薄膜会与CO2和H2O发生还原反应。这对加工和存储由这些薄膜制成的纳米级设备提出了挑战。研究了用1%溴-乙醇腐蚀液制作50 nm图案化YBCO薄膜的简便方法。拉曼散射、能谱分析、原子力显微镜和HIM成像显示了表面形貌和成分的变化。RT测量表明,溴化后∼的电学变化为3 nm,INTc略有下降(86.5K至86.4K)。我们的结论是,YBCO的溴化反应具有最小的电学影响。
Cuprate high-temperature superconducting (HTS) thin films like YBa2Cu3O6+x(YBCO) are subject to reduction reactions with CO2and H2O. This poses a challenge for processing and storing nanoscale devices made from these films. A 1% bromine–ethanol etchant solution was investigated as a facile processing method for thin 50 nm films of patterned YBCO. Raman scattering, EDS, AFM, and HIM imaging show changes in the surface morphology and composition. RT measurements show electrical changes to a depth of ∼3 nm after bromination and a slight reduction inTc(86.5 to 86.4 K). We conclude that bromination of YBCO has minimal electrical consequences.