Measuring the effects of low energy ion milling on the magnetization of Co/Pd multilayers using scanning electron microscopy with polarization analysis
Measuring the effects of low energy ion milling on the magnetization of Co/Pd multilayers using scanning electron microscopy with polarization analysis
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DOI：
10.1063/1.3358218
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发表时间：
2010-05-01
影响因子：
3.2
通讯作者：
Unguris, J.
中科院分区：
文献类型：
--
作者：
McMorran, B. J.;Cochran, A. C.;Unguris, J.
利用扫描电镜偏振分析（SEMPA）研究了Co (0.4 nm)/Pd （0.6 nm）极薄层Co/Pd多层膜的磁化谱与离子铣削能量的关系。比较了50 eV、1 keV和2 keV下离子铣削对Co/Pd磁化角分布的影响。我们发现，当材料被移除时，1和2 keV的Ar离子铣削引起了可测量的面外磁化角分布的变化，但50 eV的Ar离子铣削并没有显著改变磁化强度。这使得使用SEMPA可以对Co/Pd多层膜表面磁化的所有三个矢量分量进行定量成像，其横向空间分辨率为20 nm。(C) 2010年美国物理研究所。(doi: 10.1063/1.3358218)
The dependence of the magnetization profile of Co/Pd multilayer films with very thin individual layers, Co (0.4 nm)/Pd (0.6 nm), on the energy of ion milling is investigated using scanning electron microscopy with polarization analysis (SEMPA). The effect of Ar ion milling on the Co/Pd magnetization angle distribution is compared for ion milling at 50 eV, 1 keV, and 2 keV. We find that 1 and 2 keV Ar ion milling causes a measurable change in the out-of-plane magnetization angle distribution as material is removed, but ion milling with 50 eV Ar ions does not significantly alter the magnetization. This enables quantitative imaging of all three vector components of the surface magnetization of the Co/Pd multilayer films with 20 nm lateral spatial resolution using SEMPA. (C) 2010 American Institute of Physics. [doi: 10.1063/1.3358218]