Photo-induced metastability in amorphous semiconductors
Photo-induced metastability in amorphous semiconductors
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DOI:
10.1016/s0022-3093(05)80044-4
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发表时间:
1991
影响因子:
3.5
通讯作者:
Kazunobu Tanaka
中科院分区:
文献类型:
--
作者:
Kazunobu Tanaka
Metastability and reversibility of a variety of photo-induced phenomena in amorphous semiconductors have been widely researched. In the introductory part of this talk, these metastable effects are briefly reviewed from a phenomenological point of view. The main part is focused on photo-induced ESR centers with g-values equal to 2.005, 2.004 and 2.01 in undoped hydrogenated- and deuterated-amorphous silicons. It has been shown from electron-spin-echo-modulation experiments using pulsed ESR techniques that (1) deuterium (or hydrogen) is separated from a photo-created dangling bond defect (as well as a native one) by at least 5 Å, (2) Si-D-Si three-center bonds were not observed in the vicinity of a dangling bond defect, and (3)29Si hyperfine structure does exist in the light-induced ESR with g=2.004 and g=2.01 and its splitting width is close to that of dangling bond centers (g=2.005). These results are discussed with an emphasis towards the structural randomness, network connectivity, and the nature of chemical bonds.