Dewetting of polymethyl methacrylate on the patterned elastomer substrate by solvent vapor treatment
Dewetting of polymethyl methacrylate on the patterned elastomer substrate by solvent vapor treatment
复制标题
通过溶剂蒸气处理对图案化弹性体基材上的聚甲基丙烯酸甲酯进行去湿
DOI:
10.1016/j.polymer.2007.04.031
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发表时间:
2007-06
期刊:
影响因子:
4.6
通讯作者:
中科院分区:
文献类型:
--
作者:
The dewetting evolution process of polymethyl methacrylate (PMMA) film on the flat and prepatterned polydimethylsiloxane (PDMS) substrates (with square microwells) by the saturated solvent of methyl ethyl ketone (MEK) treatment has been investigated at room temperature by the optical microscope (OM) and atomic force microscope (AFM). The final dewetting on the flat PDMS substrate led to polygonal liquid droplets, similar to that by temperature annealing. However, on the patterned PDMS substrate, depending on the microwells' structure of PDMS substrate and defect positions that initiated the rupture and dewetting of PMMA, two different kinds of dewetting phenomena, one initiated around the edge of the microwells and another initiated outside the microwells, were observed. The forming mechanism of these two different dewetting phenomena has been discussed. The microwells were filled with liquid droplets of PMMA after dewetting due to the formation of fingers caused by the pinning of the three-phase-line at the edge of the microwells and their rupture.
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DOI:
10.1002/(sici)1439-2054(20000301)276:1
发表时间:
2000-03
影响因子:
3.9
作者:
E. Meyer;H. Braun
通讯作者:
E. Meyer;H. Braun
影响因子:
3.9
作者:
Kargupta, K;Sharma, A
通讯作者:
Sharma, A
影响因子:
3.9
作者:
Sehgal, A;Ferreiro, V;Karim, A
通讯作者:
Karim, A
影响因子:
8.6
作者:
Sharma, A;Khanna, R
通讯作者:
Khanna, R
DOI:
10.1016/s1359-0294(00)00086-8
发表时间:
2001-02
影响因子:
8.9
作者:
R. Lipowsky
通讯作者:
R. Lipowsky