A novel and simple fabrication method of embedded SU-8 micro channels by direct UV lithography
A novel and simple fabrication method of embedded SU-8 micro channels by direct UV lithography
复制标题
一种新颖简单的直接紫外光刻嵌入式SU-8微通道制造方法
DOI：
10.1088/1742-6596/34/1/054
复制
发表时间：
2006
影响因子：
2.3
通讯作者：
H. Huang
中科院分区：
文献类型：
--
作者：
C. Fu;C. Hung;H. Huang
本文提出了一种新颖而简单的制作嵌入式微通道的方法。该方法基于SU-8厚光刻胶在不同入射紫外波长下的不同光吸收特性。沟道结构由普通的I线限定，而覆盖层由深UV图案化。由于深紫外是直接在同一个对准器上用一组滤光镜获得的，所以嵌入式通道可以很容易地产生，而不需要其他罕见的设施。此外，通过巧妙设计的实验，测量了顶层厚度与深紫外曝光剂量的关系。嵌入式微通道的顶层的特定厚度然后可以通过特定的深UV曝光剂量来确保。利用该方法实现了许多有意义的机械结构，并对顶层材料的性能进行了测试。
In this paper, we presents a novel and simple method to fabricate embedded micro channels. The method based on different light absorption properties of the SU-8 thick photoresist under different incident UV wavelengths. The channel structures are defined by the ordinary I-line, while the cover layer is patterned by the deep UV. Because the deep UV is obtained directly on the same aligner with a set of filter mirrors, the embedded channel can be easily produced without other rare facilities. Besides, the relationship between the thickness of the top layer and the exposure dose of the deep UV has been measured by an ingeniously designed experiment. The specific thickness of the top layer of the embedded micro channel can then be secured by the specific deep-UV exposure dose. Further more, many meaningful mechanical structures have been realized by this method, the material property of the top layer are also measured.