Properties of ion assisted deposited titania films
Properties of ion assisted deposited titania films
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离子辅助沉积二氧化钛薄膜的性能
DOI：
10.1063/1.353868
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发表时间：
1993
影响因子：
3.2
通讯作者：
S. Mohan
中科院分区：
文献类型：
--
作者：
M. Krishna;K. N. Rao;S. Mohan
用氧离子辅助沉积技术制备了二氧化钛薄膜，氧离子能量范围为100-500 eV，电流密度高达100μA/cm~2。观察到薄膜的折射率增加到300 eV，消光系数仅名义上增加到300 eV。光学带隙计算表明，带隙与入射离子的能量有很强的相关性。超过离子的临界能量和电流密度，薄膜的折射率和消光系数开始恶化。研究还发现，超过临界值后，光学带隙减小。在能量为300 eV，电流密度为50μA/cm~2时，得到的最大折射率为2.49。沉积后温度为500 °C时，薄膜的折射率略有增加，但对消光系数没有影响。X-射线衍射研究表明，这些薄膜为单相锐钛矿结构。
Thin films of titanium dioxide have been deposited using ion assisted deposition with oxygen ions in the energy range 100–500 eV and current densities up to 100 μA/cm2. It has been observed that the refractive index of the films increases up to 300 eV and the extinction coefficient increased only nominally up to 300 eV. Optical band gap calculations have shown a strong dependence of the gap on the energy of incident ions. Beyond a critical energy and current density of the ions the refractive index and extinction coefficient of the films start deteriorating. It has also been found that beyond the critical values the optical band gap value decreases. The maximum refractive index obtained was 2.49 at an energy of 300 eV and 50 μA/cm2 current density. Post‐deposition annealing of the films at 500 °C resulted in a slight increase in refractive index without affecting the extinction coefficient. X‐ray diffraction studies revealed a monophasic anatase structure in these films.