Enhanced microchannel plate performance at high particle fluxes by pulsed exposure mode of operation
Enhanced microchannel plate performance at high particle fluxes by pulsed exposure mode of operation
复制标题
通过脉冲曝光操作模式增强微通道板在高颗粒通量下的性能
DOI：
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发表时间：
2004
期刊：
影响因子：
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通讯作者：
R. Akers
中科院分区：
文献类型：
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作者：
M. Tournianski;P. Carolan;R. Akers
在饱和模式下操作微通道板（MCP）提供了一个简单的光子和粒子计数检测器。然而，在单个事件之后有一个有限的恢复时间，在此期间单个微通道不再响应，从而降低了整体灵敏度。在连续的高通量水平，从测量到真实通量的修正变得越来越大，因为活微通道的比例迅速衰减到低值。对到达MCP的磁通进行门控大大增加了活动微通道的比例，允许进行周期性测量，以适应高通量和相关的低误差。这种改进已经在百万安培球形托卡马克上的中性粒子分析仪中观察到。一个简单的分析处理说明了测量到的改进。
Operating a microchannel plate (MCP) in saturated mode provides a simple photon and particle counting detector. However, there is a finite recovery time after individual events during which individual microchannels no longer respond, reducing the overall sensitivity. At continuous high flux levels, the corrections from measured to true flux become increasingly large as the fraction of live microchannels rapidly decays to low values. Gating the flux arriving at the MCP greatly increases the proportion of live microchannels allowing periodic measurements to be made that accommodate high fluxes and associated low errors. Such improvements have been observed in a neutral particle analyzer on the Mega Ampere Spherical Tokamak. A simple analytical treatment accounts for the measured improvements.