Electrochemical polishing of boron-doped diamond in organic media
Electrochemical polishing of boron-doped diamond in organic media
复制标题
有机介质中掺硼金刚石的电化学抛光
DOI：
10.1149/1.1619646
复制
发表时间：
2003
影响因子：
--
通讯作者：
C. Comninellis
中科院分区：
文献类型：
--
作者：
M. Panizza;G. Siné;I. Duo;L. Ouattara;C. Comninellis
研究了化学气相沉积法制备的掺硼金刚石（BDD）膜在HOAc-H2SO 4介质中的电解抛光。采用SEM、XPS和电化学方法对抛光表面进行了表征。测量.在1 M H2SO 4中，即使延长时间也不会发生表面抛光;相反，在含有Na 2SO 4的电解液中，表面抛光的程度会降低。3 M HOAc在1 M H2SO 4中的溶液，变化很快。作为抛光工艺的典型结果，表面变得更光滑并且粗糙度降低。所有的非金刚石杂质也通过HOAc介质中的电解抛光处理去除。[on Scientists（R）]
The electropolishing of a B-doped diamond (BDD) film deposited by CVD was studied in HOAc-H2SO4 media. The electropolished surface was characterized by SEM, XPS, and electrochem. measurements. In 1 M H2SO4 no polishing of the surface occurred even after prolonged time; on the contrary, in electrolyte contg. 3 M HOAc in 1 M H2SO4 the morphol. changed rapidly. The surface became smoother and the roughness decreased as the typical results of a polishing process. All the nondiamond impurities were also removed by the electropolishing treatment in HOAc media. [on SciFinder (R)]