In Situ Surface X-Ray Diffraction Studies of the Influence of the PEG-Cl-Complex on Homoepitaxial Electrodeposition on Cu(001)
In Situ Surface X-Ray Diffraction Studies of the Influence of the PEG-Cl-Complex on Homoepitaxial Electrodeposition on Cu(001)
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DOI:
10.1149/2.027312jes
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发表时间:
2013
影响因子:
3.9
通讯作者:
F. Golks;Y. Gründer;A. Drünkler;J. Roy;J. Stettner;J. Zegenhagen;O. Magnussen
中科院分区:
文献类型:
--
作者:
F. Golks;Y. Gründer;A. Drünkler;J. Roy;J. Stettner;J. Zegenhagen;O. Magnussen
The influence of polyethylene glycol (PEG) on the atomic-scale interface structure and Cu growth behavior of Cu (001) in chloride-containing electrolyte was investigated by in situ surface X-ray diffraction. Studies in Cu-free solution unambiguously verify the presence of the ordered c (2× 2) chloride adlayer in the presence of the polymer as well as reversible Cl adsorption/desorption and an order-disorder transition in the adlayer. The partially ordered chloride adlayer is found over a wider potential range as compared to PEG-free electrolyte, indicating stabilization of this adsorbate phase. Crystal truncation and superstructure rod measurements reveal that the polymer interacts more strongly with the partially c (2× 2) Cl covered surface than with the close-packed c (2× 2) adlayer at saturation coverage. In Cu-containing electrolyte layer-by-layer growth was observed at potentials≤− 0.35 V vs. Ag/AgCl. The deposition rate was significantly reduced as compared to PEG-free electrolyte, providing clear evidence of inhibition on the atomic-scale. At more positive potentials a crossover to 3D growth and increasing surface roughness is found.