Single layer hexagonal boron nitride films on Ni(110)
Single layer hexagonal boron nitride films on Ni(110)
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DOI：
10.1380/ejssnt.2006.410
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发表时间：
2006-01-01
影响因子：
0.7
通讯作者：
Osterwalder, Jurg
中科院分区：
文献类型：
--
作者：
Greber, Thomas;Brandenberger, Louis;Osterwalder, Jurg
采用化学气相沉积法在镍（110）上生长六方氮化硼。利用低能电子衍射（LEED）和角分辨光电发射（ARUPS）研究了Ni（110）表面的h-BN层。LEED显示的是（1 × 6）和（7 × 5）超级结构。h-BN的sigma波段ARUPS显示为单层h-BN，但有两个不同方向的h-BN布里渊带，相对权重为6:1。这与锁定能量的论点是一致的，它考虑了镍原子和氮原子之间的重合晶格。
Hexagonal boron nitride was grown on nickel (110) by chemical vapor deposition of borazine. The h-BN layers on Ni(110) were investigated by low energy electron diffraction (LEED) and angular resolved photoemission (ARUPS). LEED shows a (1 x 6) and a (7 x 5) super structure. ARUPS from the sigma bands of h-BN indicates single layer h-BN, but two different orientations of the h-BN Brillouin zones with a relative weight of 6:1. This is in line with lock in energy arguments, which consider coincidence lattices between nickel top atoms and nitrogen atoms.