A spectroscopic study of active species in DC and HF flowing discharges in - and Ar - - mixtures
A spectroscopic study of active species in DC and HF flowing discharges in - and Ar - - mixtures
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在 - 和 Ar - - 混合物中直流和高频流动放电中活性物质的光谱研究
DOI：
10.1088/0963-0252/5/3/026
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发表时间：
1996
影响因子：
3.8
通讯作者：
P. Stratil
中科院分区：
文献类型：
--
作者：
S. Bockel;J. Amorim;G. Baravian;A. Ricard;P. Stratil
发射光谱和激光诱导荧光 (LIF) 技术用于研究 DC 和 HF 和 Ar 流动放电和后放电中活性物质的产生，与表面处理的等离子体反应相关。 N 和 H 基态原子相对密度是通过流动 DC 放电以及 DC 和 HF 后放电区域中的双光子 LIF 获得的。产生 N 和 H 物质最大密度的条件在每种情况下根据等离子体动力学确定。在放电后区域中没有观察到 NH 自由基，这表明该自由基对氮化过程没有贡献。
Optical emission spectroscopy and laser-induced fluorescence (LIF) techniques are used to study the production of active species in DC and HF - and - - Ar flowing discharges and post-discharges, in connection with plasma reactions for surface treatments. N and H ground state atom relative densities are obtained by two-photon LIF in a - flowing DC discharge and in the DC and HF post-discharge regions. The conditions to create maximum density of N and H species are determined in each case in relation to the plasma kinetics. In no case was the NH radical observed in the post-discharge regions, indicating that this radical does not contribute to the nitriding process.