Impacts of substrate bias and dilution gas on the properties of Si-incorporated diamond-like carbon films by plasma deposition using organosilane as a Si source
Impacts of substrate bias and dilution gas on the properties of Si-incorporated diamond-like carbon films by plasma deposition using organosilane as a Si source
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DOI：
10.1016/j.tsf.2018.03.075
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发表时间：
2018-05
期刊：
影响因子：
2.1
通讯作者：
H. Nakazawa;S. Miura;K. Nakamura;Y. Nara
中科院分区：
文献类型：
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作者：
H. Nakazawa;S. Miura;K. Nakamura;Y. Nara
