Using epoxy-based lithography to probe confinement effects on active nematics
Using epoxy-based lithography to probe confinement effects on active nematics
复制标题
使用环氧基光刻来探测对活性向列相的限制效应
DOI:
10.1117/12.2528602
复制
发表时间:
2019
期刊:
影响因子:
--
通讯作者:
Hirst, Linda S.
中科院分区:
文献类型:
--
作者:
Khaladj, Dimitrius A.;Tan, Amanda J.;Hirst, Linda S.
Active nematics are out-of-equilibrium liquid crystal fluids composed of rod-like subunits, which can generate large-scale, self-driven flows. In this emerging field of active nematics, new methods are needed to investigate and potentially control phase structure and dynamics. The use of complex engineered surfaces using microfabrication is an excellent way to control local orientation directors, taking advantage of the interplay between surface curvatures and topological defects. Epoxy-based lithography represents a simple and appealing approach, using low cost, minimal materials and a time efficient process. In this manuscript, we discuss methods for optimized fabrication protocols using negative and positive tone epoxy-based photoresists to create microfluidic devices for active matter. Arrays of curved objects and submerged topographies can be used to generate a variety of liquid crystal defect configurations not typically observed on unconfined planar surfaces.
DOI:
10.1073/pnas.1816733116
发表时间:
2019-03-12
影响因子:
11.1
作者:
Opathalage, Achini;Norton, Michael M.;Dogic, Zvonimir
通讯作者:
Dogic, Zvonimir
DOI:
--
发表时间:
2017
期刊:
影响因子:
--
作者:
Zhenlu Cui;Jianbing Su;Xiaoming Zeng
通讯作者:
Xiaoming Zeng
影响因子:
3.4
作者:
T. Shendruk;A. Doostmohammadi;K. Thijssen;J. Yeomans
通讯作者:
J. Yeomans