Electron–Modulated-Acoustic-Phonon Interactions in a Coated Silicon Nanowire

Electron–Modulated-Acoustic-Phonon Interactions in a Coated Silicon Nanowire
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涂层硅纳米线中的电子调制声声子相互作用

DOI:
10.1143/jjap.49.04dn09
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发表时间:
2010
影响因子:
1.5
通讯作者:
K. Nakazato
K. Nakazato
中科院分区:
物理与天体物理4区
文献类型:
--
作者:
J. Hattori;S. Uno;N. Mori;K. Nakazato

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从理论上研究了包覆圆柱形硅纳米线中的调制声子及其与电子的相互作用。声学声子对相互作用的影响被封装在形状因子中。SiO2-涂覆的SiNW的形状因子大于使用体声子计算的形状因子,而HfO 2-涂覆的SiNW的形状因子较小,当涂层壳厚度足够大时。这一结果可以用纳米线核壳之间的声阻抗关系来定性解释。形状因子的减小直接削弱了相互作用,从而提供了比体声子所限制的更高的电子迁移率。
Modulated acoustic phonons and their interactions with electrons in a coated cylindrical silicon nanowire (SiNW) are investigated theoretically. The impact of acoustic phonons on the interactions is encapsulated in the form factor. The form factor for a SiO2-coated SiNW is larger than that calculated using bulk phonons while that for a HfO2-coated SiNW is smaller, when the coating shell thickness is sufficiently large. This result can be qualitatively explained by the relationship of acoustic impedance between the nanowire core and shell. The form factor reduction directly weakens the interactions, and thereby provides higher electron mobility than that limited by bulk phonons.
DOI: 10.1103/physrevb.71.085303
发表时间: 2005-02
期刊: Physical Review B
影响因子: 3.7
作者:
S. Mizuno
通讯作者: S. Mizuno
具有缺陷层的纳米线超晶格中的局域扭转模式
DOI: --
发表时间: 2008
期刊: Japanese Journal of Applied Physics 47(印刷中)
影响因子: --
作者:
Norihiro Muroyama;Tetsu Ohsuna;Ryong Ryoo;Yoshiki Kubota;Osamu Terasaki;Seiji Mizuno
通讯作者: Seiji Mizuno