Photosensitive poly(methacrylates) having styrylpyridinium and styrylquinolinium groups

Photosensitive poly(methacrylates) having styrylpyridinium and styrylquinolinium groups
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DOI:
10.1002/pola.1987.080251111
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发表时间:
1987-11
期刊:
Journal of Polymer Science Part A
影响因子:
--
通讯作者:
K. Ichimura;Noboru Oohara
K. Ichimura;Noboru Oohara
中科院分区:
其他
文献类型:
--
作者:
K. Ichimura;Noboru Oohara

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介绍了三种将可光二聚的苯乙烯基吡啶鎓或苯乙烯基喹啉鎓基团引入甲基丙烯酸酯聚合物的方法。其中,甲基丙烯酸酯单体与甲基丙烯酸化苯乙烯基吡啶或苯乙烯基喹啉的共聚提供了最方便的方法来制备光敏聚合物,因为具有高含量的光功能基团的聚合物具有优异的溶解性。随后用对甲苯磺酸处理以季铵化吡啶或喹啉部分使得聚合物高度光敏。发现具有苯乙烯基喹啉鎓基团的聚合物对Ar激光的488 nm光敏感,并且当光敏基团的含量为15摩尔%时,灵敏度为约3 mJ/cm 2。
Three methods to introduce photodimerizable styrylpyridinium or styrylquinolinium groups to methacrylate polymers are described. Among these, copolymerization of methacrylate monomers with methacrylated styrylpyridine or styrylquinoline offered the most convenient procedure to prepare photosensitive polymers because of the excellent solubility of the polymers having the photofunctional groups in high content. Subsequent treatment withp‐toluenesulfonic acid to quaternize the pyridine or quinoline moiety made the polymer highly photosensitive. The polymers having a styrylquinolinium group were found to be sensitive to 488 nm light of an Ar laser, and the sensitivity was about 3 mJ/cm2when the content of the photosensitive group was 15 mol %.