Inkjet-printing of antimony-doped tin oxide (ATO) films for transparent conducting electrodes.

Inkjet-printing of antimony-doped tin oxide (ATO) films for transparent conducting electrodes.
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用于透明导电电极的锑掺杂氧化锡 (ATO) 薄膜的喷墨印刷。

DOI:
10.1166/jnn.2012.4622
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发表时间:
2012
影响因子:
--
通讯作者:
Jihoon Kim
Jihoon Kim
中科院分区:
工程技术4区
文献类型:
--
作者:
J. Lim;Bong;H. Yoon;Sungnam Lee;Jihoon Kim

文献摘要

被引文献

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采用喷墨印刷法制备了掺锑氧化锡(ATO)纳米粒子薄膜。为了了解快速热退火(RTA)温度的影响,ATO薄膜的电学和光学性能进行了研究。随着退火温度的升高,喷墨印刷ATO薄膜的方块电阻和电阻率降低。在700 ℃退火的膜显示出1.7 × 10(3)Ω/sq的薄层电阻,膜厚度为350 nm。薄膜的光学透射率保持不变,无论其退火温度。为了进一步降低薄膜的薄层电阻以及退火温度,在两层喷墨印刷的ATO之间印刷Ag网格。在1.5 mm Ag线间距下,Ag网格嵌入的ATO膜在300 ℃下RTA后显示出25.6 Ω/sq的薄层电阻。
Antimony-doped Tin oxide (ATO) films have been prepared by inkjet-printing method using ATO nanoparticle inks. The electrical and optical properties of the ATO films were investigated in order to understand the effects of rapid thermal annealing (RTA) temperatures. The decrease in the sheet resistance and resistivity of the inkjet-printed ATO films was observed as the annealing temperature increased. The film annealed at 700 degrees C showed the sheet resistance of 1.7 x 10(3) Omega/sq with the film thickness of 350 nm. The optical transmittance of the films remained constant regardless of their annealing temperatures. In order to further reduce the sheet resistance of the films as well as the annealing temperature, Ag-grid was printed in between two layers of inkjet-printed ATO. With 1.5 mm Ag line spacing, the Ag-grid embedded ATO film showed the sheet resistance of 25.6 Omega/sq after RTA at 300 degrees C.