The Influence of Annealing on the Structure and Hardness of Electrodeposited Chromium
The Influence of Annealing on the Structure and Hardness of Electrodeposited Chromium
复制标题
退火对电沉积铬组织和硬度的影响
DOI：
10.1080/00202967.1954.11869634
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发表时间：
1954
期刊：
影响因子：
--
通讯作者：
G. Smith
中科院分区：
文献类型：
--
作者：
C. Brittain;G. Smith
传统电沉积铬的电子显微照片，然后在高达 700°C 的一系列温度下退火。被提出。 700℃退火1小时后获得的平均晶粒直径。为 7,900 Å；随着退火温度降低至 1460 Å（在 450°C 下退火 1 小时），它逐渐减小。硬度也随之变化，但这并不一定意味着硬度的增加是由晶粒尺寸的减小引起的；退火过程中其他因素（例如氧化物分散、应力、择优取向和氢含量）的变化很可能导致晶粒尺寸和硬度的变化。
Electron-micrographs of chromium conventionally electrodeposited and then annealed at a series of temperatures up to 700°C. are presented. The mean grain diameter obtained after a 1-hour anneal at 700°C. was 7,900 Å; it diminshed steadily with reduction of annealing temperature to 1460 Å for a 1-hour anneal at 450°C. The hardness showed a concomitant change, but this does not necessarily mean that increase of hardness is caused by decrease in grain size; changes during annealing of other factors such as oxide dispersion, stress, preferred orientation and hydrogen content may well cause the changes both in grain size and in hardness.