Electrochromic behavior of WO3 thin films prepared by GLAD

Electrochromic behavior of WO3 thin films prepared by GLAD
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GLAD制备WO3薄膜的电致变色行为

DOI:
10.1016/j.apsusc.2018.03.248
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发表时间:
2018-07
影响因子:
6.7
通讯作者:
a
a
中科院分区:
材料科学1区
文献类型:
--
作者:
Yuan Jiali;Wang Bin;Wang Hu;Chai Yingjie;Jin Yaxue;Qi Hongji;Shao Ji;a

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通过掠射角沉积(GLAD)制备的WO3薄膜被认为是具有良好离子扩散作用的优异电致变色涂层。 GLAD制备的~500 nm薄膜具有较大的透射率调制。系统地表征了退火处理后WO3薄膜的结晶结构、表面形貌、化学状态、光学和电致变色性能。与退火的WO3多孔纳米结构薄膜相比,非晶态沉积薄膜表现出较高的着色效率和稳定的可逆性。此外,GLAD WO3薄膜由于具有双折射性,在p偏振光照射下表现出可调的角度选择性,这可以扩展纳米结构薄膜在电致变色领域的应用范围。
WO3thin films fabricated by glancing angle deposition (GLAD) are proposed as excellent electrochromic coatings with favorable ion diffusion. A ∼ 500-nm film prepared by GLAD had a relatively large transmittance modulation. The crystallization structure, surface morphology, chemical state, optical and electrochromic properties of WO3thin films were systematically characterized upon annealing treatment. Compared with annealed WO3porous nanostructured films, the amorphous as-deposited films exhibited a high coloration efficiency and stable reversibility. Furthermore, the GLAD WO3films exhibit the tunable angular selectivity under illumination with p-polarized light because of the birefringence, which could extend the application range of nanostructured films in the electrochromic field.
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