Ion composition produced by high power impulse magnetron sputtering discharges near the substrate
Ion composition produced by high power impulse magnetron sputtering discharges near the substrate
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DOI：
10.1063/1.3000446
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发表时间：
2008-10
影响因子：
3.2
通讯作者：
A. Ehiasarian;A. Vetushka;A. Hecimovic;S. Konstantinidis
中科院分区：
文献类型：
--
作者：
A. Ehiasarian;A. Vetushka;A. Hecimovic;S. Konstantinidis
利用朗缪尔探针分析、质谱分析和原子吸收光谱研究了高功率脉冲磁控溅射(HIPIMS)放电中衬底附近的等离子体成分。HIPIMS放电在非反应Ar气氛中进行，气压为2.66Pa.磁控阴极配备了钛靶材.研究了放电电流对等离子体密度、金属离子/中性比和气体离子/金属离子比的影响。结果表明，在峰值放电电流密度为∼1 A cm−2的情况下，高密度等离子体(Ne∼10 18m−3)在电源关闭后从靶向衬底膨胀，持续时间超过330μ。溅射材料的时间平均离子能量分布函数的形状从Thompson分布转变为Maxwell分布，表明放电过程中能量传递有效。等离子体中的金属含量随着放电电流的增大而单调增加，金属离子与中性金属的比例达到最大值。
Plasma composition near the substrate was investigated in a high power impulse magnetron sputtering (HIPIMS) discharge using Langmuir probe analysis, mass spectroscopy, and atomic absorption spectroscopy. The HIPIMS discharge was operated in nonreactive Ar atmosphere at a pressure of 2.66 Pa and the magnetron cathode was furnished with Ti target. Plasma density, metal ion-to-neutral ratio, and gas ion-to-metal ion ratio were studied as a function of discharge current. At peak discharge current densities of ∼1 A cm−2, the results show that a dense plasma (ne∼1018 m−3) expanded from the target toward the substrate and lasted more than 330 μs after the supplied power was turned off. The shape of the time-averaged ion energy distribution function of sputtered material exhibited a transition from Thompson to Maxwellian distribution, indicating efficient energy transfer in the discharge. The metal content in the plasma monotonically increased with discharge current and the metal ion-to-neutral ratio reached app...