Performance enhancement of a ZnMgO film UV photodetector by HF solution treatment
Performance enhancement of a ZnMgO film UV photodetector by HF solution treatment
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通过 HF 溶液处理增强 ZnMgO 薄膜紫外光电探测器的性能
DOI：
10.1039/c7tc03352d
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发表时间：
2017
影响因子：
6.4
通讯作者：
Dezhen Shen
中科院分区：
文献类型：
--
作者：
Xing Chen;Kewei Liu;Xiao Wang;Binghui Li;Zhenzhong Zhang;Xiuhua Xie;Dezhen Shen
氧的吸附和脱附过程会严重降低ZnO基紫外光探测器的响应速度。ZnO基薄膜的表面钝化是提高响应速度的常用方法，但传统钝化技术的效果通常不是很明显，往往伴随着响应度的下降。在此，我们提出了一种新的方法来克服这个问题：用HF溶液处理ZnMgO紫外光电探测器。有趣的是，用HF溶液处理后，器件的90-10%衰减时间减少了一个数量级以上（从4.6 ms到0.34 ms），这可以归因于由于F改性的表面，ZnMgO表面上的氧吸附速度的增强。此外，在10 V的偏压下，暗电流从0.7 pA降低到0.4 pA，响应度从145 A W−1增加到326 A W−1。因此，HF溶液化学处理是提高ZnMgO紫外探测器性能的有效方法。
Oxygen adsorption and desorption processes can strongly slow down the response speed of ZnO-based ultraviolet photodetectors. Surface passivation of ZnO-based films is a common method to increase the response speed, but the effect of the traditional passivation technology is usually not very obvious, and often accompanies a decrease in responsivity. Herein we propose a new method to overcome this problem: treating ZnMgO UV photodetectors with HF solution. Interestingly, after treatment with HF solution, the 90–10% decay time of the device is decreased by more than one order of magnitude (from 4.6 ms to 0.34 ms), which can be attributed to the enhancement of the oxygen adsorption speed on the surface of ZnMgO due to the F-modified surface. Moreover, the dark current is decreased from 0.7 pA to 0.4 pA at a bias of 10 V and the responsivity is increased from 145 A W−1 to 326 A W−1. Thus, chemical treatment with HF solution should be a useful and effective method for improving the performance of ZnMgO UV photodetectors.