Characterization of band offset in α-(AlxGa1-x)2O3/ α-Ga2O3 heterostructures
Characterization of band offset in α-(AlxGa1-x)2O3/ α-Ga2O3 heterostructures
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α-(AlxGa1-x)2O3/α-Ga2O3 异质结构中能带偏移的表征
DOI:
10.1109/iciprm.2016.7528743
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发表时间:
2016
期刊:
影响因子:
--
通讯作者:
S. Fujita
中科院分区:
文献类型:
--
作者:
T. Uchida;Riena Jinno;S. Takemoto;K. Kaneko;S. Fujita
Gallium Oxide is a promising material for power device applications. We focused on corundum structured gallium oxide (α-Ga<sub>2</sub>O<sub>3</sub>) and α-(Al<sub>x</sub>Ga<sub>1-x</sub>)<sub>2</sub>O<sub>3</sub>/ α-Ga<sub>2</sub>O<sub>3</sub> heterostructure devices. We prepared α-(Al<sub>x</sub>Ga<sub>1-x</sub>)<sub>2</sub>O<sub>3</sub> alloy and these laminate structures on c-plane sapphire substrates. The band offset of the α-Ga<sub>2</sub>O<sub>3</sub>/α-(Al<sub>x</sub>Ga<sub>1-x</sub>)<sub>2</sub>O<sub>3</sub> heterostructure was measured by X-ray photoelectron spectroscopy (XPS). The band alignment was estimated to be type I with very narrow valence-band offset energy.